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Martin Van den brink on R&D investment

From Oral History of Martin van den Brink · · Computer History Museum

“I have a simple rule. It needs to be between 20 and 20 and 10%. And 20 and 10% is depending on the business cycle more than anything else. So in fact if you have ex if you spent one year 15% you could spend up the next year with the same spending 20% if your business go down or the business goes up and you're ending up as spending 10%. So you I have a slow adoption rate to the to the business between 10 and 20%. And try to stay within those boundaries but we really like to get stability and on the long-term road map.”

Martin Van den brink
Cofounder, ASML
Policy Impact R&D investmentfinancial strategylong-term planning

On , Martin Van den brink, Cofounder at ASML, spoke about R&D investment during Oral History of Martin van den Brink on Computer History Museum.

Oral History of Martin van den Brink
Watch on YouTube at 3:34:15
Oral History of Martin van den Brink
Watch on YouTube at 3:34:15
Interviewed by Dag Spicer on 2025-09-16 © Computer History Museum This oral history documents the professional trajectory and technical leadership of Martin van den Brink, longtime architect of lithography systems at ASML. Through a detailed recounting of his early education, entry into Philips and ASML, and subsequent decades of engineering work, van den Brink describes the evolution of optical lithography from early step-and-repeat systems to immersion and EUV technologies. The interview highlights his central role in advancing alignment, optics, and mechatronic subsystems; in developing partnerships with key suppliers such as Zeiss and Cymer; and in shaping ASML’s modular design philosophy and collaborative research culture with institutions like IMEC. Van den Brink reflects on the shifting dynamics of semiconductor manufacturing, the decline of vertically integrated research labs, and the rise of computational lithography and multi-patterning. His narrative offers a first-person account of the technological, organizational, and industrial forces that enabled ASML to become the world’s leading lithography supplier. Note: Transcripts represent what was said in the interview. However, to enhance meaning or add clarification, interviewees have the opportunity to modify this text afterward. This may result in discrepancies between the transcript and the video. Please refer to the transcript for further information - http://www.computerhistory.org/collec... Visit https://www.computerhistory.org/colle... for more information about the Computer History Museum's Oral History Collection. Catalog number: 300000159 Acquisition number: 2025.0135
Martin Van den brink

About Martin Van den brink

Cofounder · ASML

In a September 2025 oral history interview with the Computer History Museum, Martin van den Brink, president and CEO of ASML, discussed his early life, career, and the company's technological trajectory. He described being diagnosed with dyslexia and following a specialized technical education path in the Netherlands before studying physics. Van den Brink recounted ASML's early reliance on suppliers due to its small size, stating, "We relied on suppliers as much as we can not because we felt this was the smartest way of doing it, but because when you are small with 50 people, your capability is simply limited and there's only one way to go fast: looking for friends." Van den Brink also addressed ASML's research and development spending, noting, "We have a simple rule: it needs to be between 10 and 20% of revenue on R&D. We're spending four billion a year in R&D." He expressed confidence in the future of lithography, saying, "This may sound a bit arrogant but I think the technology of lithography is unlikely to determine the end point. It's very likely that the whole chip roadmap will continue to scale at least for the foreseeable future at least 10 years from now, 15 years from now." Additionally, he offered a critical view of current AI development, stating, "The current AI is almost lazy and prefers to extend the model size and add learning cycles rather than simplify the model."

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